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Organic semiconductor wastewater treatment using a four-stage Bardenpho with membrane system

Title
Organic semiconductor wastewater treatment using a four-stage Bardenpho with membrane system
Author
이용우
Keywords
four-stage Bardenpho; hydraulic retention time; membrane; semiconductor; specific denitrification rate
Issue Date
2014-11
Publisher
Selper Ltd.
Citation
Environmental Technology (United Kingdom), v. 35, NO. 22, Page. 2837-2845
Abstract
Electronic wastewater from a semiconductor plant was treated with a pilot-scale four-stage Bardenpho process with membrane system. The system was operated over a 14-month period with an overall hydraulic retention time (HRT) ranging from 9.5 to 30 h. With a few exceptions, the pilot plant consistently treated the electronic wastewater with an average removal efficiency of chemical oxygen demand (COD) and total nitrogen of 97% and 93%, respectively, and achieving effluent quality of COD < 15 mg/L, turbidity < 1, and silt density index < 1. Based on removal efficiencies of the pilot plant, it is possible to lower the HRT to less than 9.5 h to achieve comparable removal efficiencies. An energy-saving configuration where an internal recycle line was omitted and the biomass recycle was rerouted to the pre-anoxic tank, can reduce energy consumption by 8.6% and gave removal efficiencies that were similar to the Bardenpho process. The system achieved pre-anoxic and post-anoxic specific denitrification rate values with a 95% confidence interval of 0.091 +/- 0.011 g NO3-N/g MLVSS d and 0.087 +/- 0.016 g NO3-N/g MLVSS d, respectively. The effluent from the four-stage Bardenpho with membrane system can be paired with a reverse osmosis system to provide further treatment for reuse purposes.
URI
https://www.tandfonline.com/doi/full/10.1080/09593330.2014.924565https://repository.hanyang.ac.kr/handle/20.500.11754/184156
ISSN
0959-3330;1479-487X
DOI
10.1080/09593330.2014.924565
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > CHEMICAL AND MOLECULAR ENGINEERING(화학분자공학과) > Articles
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