metal assisted chemical etching; metallurgical silicon; silicon nanowire; metal impurities; photoelectrochemical cell
Issue Date
2013-06
Publisher
WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Citation
Advanced Materials, v. 25, NO. 23, Page. 3187-3191
Abstract
Through metal-assisted chemical etching (MaCE), superior purification of dirty Si is observed, from 99.74 to 99.9884% for metallurgical Si and from 99.999772 to 99.999899% for upgraded metallurgical Si. In addition, large areas of silicon nanowires (SiNW) are fabricated. The purification effect induces a similar to 35% increase in photocurrent for a SiNW based photoelectrochemical cell.