Compliance Current-Controlled Conducting Filament Formation in Tantalum Oxide-Based RRAM Devices with Different Top Electrodes
- Title
- Compliance Current-Controlled Conducting Filament Formation in Tantalum Oxide-Based RRAM Devices with Different Top Electrodes
- Author
- ABBAS, HAIDER
- Keywords
- memristor; compliance control; dual-mode switching; Ta2O5; top electrode effect
- Issue Date
- 2020-04-28
- Publisher
- ACS
- Citation
- ACS Applied Electronic Materials, v. 2, no. 4, Page. 1154-1161
- Abstract
- Memristive switching with digital set and multistep analog reset characteristics were demonstrated in tantalum oxide (Ta2O5)-based resistive random access memory (RRAM) devices using Ti and Ag top electrodes (TEs). The Ta2O5-based device with a Ti TE requires a forming process to initiate the switching and exhibits a gradual resistance increase behavior with the sequential increase in voltage in the reset process. The Ta2O5-based device with a Ag TE shows a slightly different switching behavior. The Ta2O5-based device with a Ag TE does not require a forming process and shows a gradual resistance increase behavior after an abrupt reset with a sequential increase in voltage in the reset process. The difference in switching behavior is because of the difference in the composition of the conducting filament in both devices. The Ta2O5-based device with a Ag TE presents a dual-mode switching mechanism with coexistence of Ag and oxygen vacancy-driven filament formation. The configuration of the conducting filament is controlled by the compliance current (I-cc). The resistive switching occurs because of oxygen vacancy filaments at low I-cc, whereas it is due to dual filaments consisting of Ag and oxygen vacancies at high I-cc. This is confirmed by the analyses of the temperature dependence of the conducting filament and the conduction mechanism. These results with unique dual-mode switching behaviors will help identify the conducting filament mechanisms and overcome the technical limitations faced by the RRAM devices.
- URI
- https://pubs.acs.org/doi/10.1021/acsaelm.0c00128https://repository.hanyang.ac.kr/handle/20.500.11754/165467
- ISSN
- 2637-6113
- DOI
- 10.1021/acsaelm.0c00128
- Appears in Collections:
- RESEARCH INSTITUTE[S](부설연구소) > RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE(산업과학연구소) > Articles
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