초분자를 이용한 자성 나노입자 패턴 형성 연구

Abstract

자성 나노입자는 지난 수십 년 동안 자성유체, 촉매, 광자학, 영상의학 등 다양한 분야에 응용되어 왔다. 본 연구에서는 다이아세틸렌 초분자를 이용하여 자성 나노입자 및 무기 나노입자 패턴 형성 방법을 조사하였다. 자성 나노입자를 포함하는 다이아세틸렌 용액을 유리나 실리콘 웨이퍼 위에 스핀코팅하여 자성나노입자-다이아세틸렌 복합체 필름을 제작한 후, 패턴마스크를 이용하여 254 nm UV를 노광하였다. 이때 자외선이 노광된 부분에만 폴리다이아세틸렌이 중합되므로 wet etching을 통하여 중합되지 않은 부분의 다이아세틸렌 단량체와 나노입자를 제거하였다. 마지막으로 열처리를 통해 폴리다이아세틸렌을 제거하면 순수한 자성 나노입자 패턴을 얻을 수 있다. 이러한 방법을 사용하면 자성 나노입자의 두께조절이 가능하며, 폴리다이아세틸렌 형성 시 색변화가 일어나므로 진행과정을 육안으로 식별 가능한 장점을 지닌다. 이 방법을 사용하여 자성 나노입자 패턴 외에도 실리카, 금, 은 나노입자의 패턴 제조가 가능함을 확인하였다.| Magnetic nanoparticles have been gaining great interest because of their applications in many fields including high-density data storage, biochemistry, hyperthermia, in vivo drug delivery and MR contrast reagent. In this thesis research, patterning of magnetic nanoparticles and inorganic nanoparticle was investigated based on a polymerizable supramolecular approach. Thus, a diacetylene solution containing magnetic nanoparticles was spin-coated on a solid substrate. The thin composite film was irradiated with 254 nm UV through a patterned photomask. Upon UV irradiation, polydiacetylene was formed by photo-polymerization in the exposed areas. Then residual diacetylene monomers and nanoparticles were washed away by wet etching. Finally, pure magnetic nanoparticle patterns were obtained by heat treatment to remove polydiacetylene. Using this method, we were able to fabricate not only magnetic nanoparticle patterns but also silica, silver and gold nanoparticle patterns.; Magnetic nanoparticles have been gaining great interest because of their applications in many fields including high-density data storage, biochemistry, hyperthermia, in vivo drug delivery and MR contrast reagent. In this thesis research, patterning of magnetic nanoparticles and inorganic nanoparticle was investigated based on a polymerizable supramolecular approach. Thus, a diacetylene solution containing magnetic nanoparticles was spin-coated on a solid substrate. The thin composite film was irradiated with 254 nm UV through a patterned photomask. Upon UV irradiation, polydiacetylene was formed by photo-polymerization in the exposed areas. Then residual diacetylene monomers and nanoparticles were washed away by wet etching. Finally, pure magnetic nanoparticle patterns were obtained by heat treatment to remove polydiacetylene. Using this method, we were able to fabricate not only magnetic nanoparticle patterns but also silica, silver and gold nanoparticle patterns.