분자층 증착법을 이용한 유기-무기 복합 박막의 제조 및 전자소자 응용 연구

Abstract

This thesis describes the fabrication of various organic-inorganic hybrid thin films via molecular layer deposition (MLD) and applications in electronic devices. In presented MLD method, high-quality hybrid thin films can be formed with self-terminating layer-by-layer growth enabling precise control over film thickness, composition and conformality at the molecular level. Such MLD method can be perfectly compatible with the atomic layer deposition (ALD) in same chamber. The MLD method combined with ALD takes advantages of the possibility of obtaining advanced organic-inorganic hybrid thin films, because a vast library of materials is accessible from single elements to compounds such as oxides, nitrides, and sulfides. Therefore, the MLD method with ALD may be an ideal fabrication technique for organic-inorganic hybrid materials providing favorable properties both organic and inorganic components. The synergic combination of flexibility, versatility of organic component and the inherent good stability, electrical properties of inorganic component render the technology attractive for application in electronic devices.|본 연구의 목적은 분자층 성장 기술을 이용한 다양한 유기-무기 복합 박막 제조하고 이를 다양한 전자소자에 응용하는 것이다. 분자층 성장 기술에서는, 박막 두께, 조성, 등각성 등을 분자 수준에서 정밀하게 조절하며 고품질의 복합 박막을 제조할 수 있으며, 기존의 원자층 성장 기술과 완벽하게 호환 할 수 있다. 다양한 종류의 유기분자 박막 및 무기 박막의 조합을 통해 기존 방법으로는 제조할 수 없는 완전히 새로운 형태의 유기-무기 복합 박막의 제조가 가능하고, 이는 유기 및 무기재료의 상승적인 결합으로 두 재료의 장점을 모두 취할 수 있는 전자 소자에 응용을 위한 매력적인 기술을 제공할 수 있다.; This thesis describes the fabrication of various organic-inorganic hybrid thin films via molecular layer deposition (MLD) and applications in electronic devices. In presented MLD method, high-quality hybrid thin films can be formed with self-terminating layer-by-layer growth enabling precise control over film thickness, composition and conformality at the molecular level. Such MLD method can be perfectly compatible with the atomic layer deposition (ALD) in same chamber. The MLD method combined with ALD takes advantages of the possibility of obtaining advanced organic-inorganic hybrid thin films, because a vast library of materials is accessible from single elements to compounds such as oxides, nitrides, and sulfides. Therefore, the MLD method with ALD may be an ideal fabrication technique for organic-inorganic hybrid materials providing favorable properties both organic and inorganic components. The synergic combination of flexibility, versatility of organic component and the inherent good stability, electrical properties of inorganic component render the technology attractive for application in electronic devices.