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Abstract

ABSTRACT

Fabrication of Organic-Inorganic Nano-laminate Thin Films by Molecular Layer Deposition-Atomic Layer Deposition for Gas Diffusion Barriers

Gas-diffusion barriers play an important role in many applications today, such as flat-panel displays or solar cells grown on plastic substrates. In particular, organic light-emitting diodes (OLEDs) need efficient encapsulation because of the high sensitivity of many organic or electrode materials to moisture and oxygen, which has been demonstrated to cause device degradation and limited lifetime. In this study, we deposited thin and highly uniform organic/inorganic hybrid thin films at low temperature(~120℃) using metal alkyls and bifunctional organic molecules by ALD/MLD method on glass and PET substrate(Melinex ST 504). Trimethyl aluminum(TMA) is used as inorganic precursor, 4-mercaptophenol(4MP) is used as organic precursor. Water vapor transmission rates(WVTR) of thin films were investigated by 144 Ca dot arrays acceleration test(70℃/70% relative humidity condition). WVTR values of thin films are below 10-6g/m2day in room condition. Al2O3/Al-4MP hybrid thin films exhibit high flexibility 1:8 ratio of the organic/inorganic layers. WVTR values are around 10-6g/m2day even the films are bent 100 times with bending radius 0.5cm. Nano-laminated Al2O3/Al4MP films could be used as gas-diffusion barrier for thin-film solar cell, flexible electric device.