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Highly Ordered Microscale-Pyramidal-Structure-Arrayed Silicon Membranes for Filter Applications

Title
Highly Ordered Microscale-Pyramidal-Structure-Arrayed Silicon Membranes for Filter Applications
Author
이성재
Keywords
KOH Etching; Pyramidal Structure; Membrane; Filter
Issue Date
2018-09
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 18, no. 9, page. 6270-6273
Abstract
Microscale-pyramidal-structure-arrayed patterned silicon membranes are manufactured using semiconductor processes and potassium hydroxide (KOH) etching techniques for filter applications. The silicon nitride on silicon on the insulator wafer functions as a masking layer, and the roughness of the silicon (100) plane strongly depends on the etching temperature and KOH concentration. To fabricate the membrane filter, a series of dry and wet etching using 45 wt% KOH solutions at the constant temperature of 70 degrees C was performed. With the dry and wet etching, micro-pyramidal arrays with 300 mu m top and 16-20 mu m bottom opening sizes were created. The morphological structures were analyzed using scanning electron microscopy. The manufactured membranes were tested as optical directional filters and particle filters.
URI
https://www.ingentaconnect.com/content/asp/jnn/2018/00000018/00000009/art00074http://repository.hanyang.ac.kr/handle/20.500.11754/120119
ISSN
1533-4880; 1533-4899
DOI
10.1166/jnn.2018.15626
Appears in Collections:
COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > PHYSICS(물리학과) > Articles
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