Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진성 | - |
dc.date.accessioned | 2019-12-07T18:18:41Z | - |
dc.date.available | 2019-12-07T18:18:41Z | - |
dc.date.issued | 2018-04 | - |
dc.identifier.citation | CERAMICS INTERNATIONAL, v. 44, no. 6, page. 6968-6972 | en_US |
dc.identifier.issn | 0272-8842 | - |
dc.identifier.issn | 1873-3956 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S0272884218301433?via%3Dihub | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/118262 | - |
dc.description.abstract | Indium oxide (InOx) thin films were synthesized by mist chemical vapor deposition (mist-CVD), using oxygen (O-2) and nitrogen (N-2) carrier gases. Relatively high growth rates are achieved with oxygen, resulting in high refractive index InOx layers. In addition, super charge transport properties are observed in InOx films grown with oxygen, as compared with those grown using nitrogen carrier gas. Also, highly-crystalline InOx layers are formed when oxygen gas is used, with nearly perfect stoichiometry and considerably low carbon content. It is speculated that the oxygen carrier stimulates the decomposition and chemical reaction of indium precursors to form indium-oxygen bonds readily, thus reducing the amount of carbon contamination and defects related to oxygen vacant sites. | en_US |
dc.description.sponsorship | This work was supported by the Industry Technology R&D program of MOTIE/KEIT [10051080, Development of mechanical UI device core technology for small and medium-sized flexible display] and done by the MOTIE Ministry of Trade, Industry & Energy (#10051403 and #10052020) and KDRC (Korea Display Research Corporation) | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | ELSEVIER SCI LTD | en_US |
dc.subject | Atmospheric process | en_US |
dc.subject | Mist chemical vapor deposition | en_US |
dc.subject | Metal oxide thin film | en_US |
dc.subject | InOx | en_US |
dc.subject | Carrier gas | en_US |
dc.title | The impact of carrier gas on the physical and electrical properties of indium oxide layers grown by mist-CVD | en_US |
dc.type | Article | en_US |
dc.relation.no | 6 | - |
dc.relation.volume | 44 | - |
dc.identifier.doi | 10.1016/j.ceramint.2018.01.129 | - |
dc.relation.page | 6968-6972 | - |
dc.relation.journal | CERAMICS INTERNATIONAL | - |
dc.contributor.googleauthor | Jeong, Hyun-Jun | - |
dc.contributor.googleauthor | Kim, Dong-Hyun | - |
dc.contributor.googleauthor | Park, Jozeph | - |
dc.contributor.googleauthor | Park, Jin-Seong | - |
dc.relation.code | 2018002213 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | jsparklime | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.