Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이성재 | - |
dc.date.accessioned | 2019-12-01T13:01:51Z | - |
dc.date.available | 2019-12-01T13:01:51Z | - |
dc.date.issued | 2017-10 | - |
dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 71, no. 8, page. 506-509 | en_US |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.issn | 1976-8524 | - |
dc.identifier.uri | https://link.springer.com/article/10.3938%2Fjkps.71.506 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/115878 | - |
dc.description.abstract | A high degree of accuracy in bulk micromachining is essential to fabricate micro-electro-mechanical systems (MEMS) devices. A series of etching experiments is carried out using 40 wt% KOH solutions at the constant temperature of 70 degrees C. Before wet etching, SF6 and O-2 are used as the dry etching gas to etch the masking layers of a 100 nm thick Si3N4 and SiO2, respectively. The experimental results indicate that (100) silicon wafer form the pyramidal structures with (111) single crystal planes. All the etch profiles are analyzed using Scanning Electron Microscope (SEM) and the wet etch rates depend on the opening sizes. The manufactured pyramidal structures are used as the pattern of silicon mold. After a short hardening of coated polydimethylsiloxane (PDMS) layer, micro pyramidal structures are easily transferred to PDMS layer. | en_US |
dc.description.sponsorship | This work was supported by Korea Institute of Science and Technology (KIST, 2E26140), National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIP) (NRF-2015R1A4A1041631), and Hallym university's Research Fund in 2016 (HRF-201608-000). | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | KOREAN PHYSICAL SOC | en_US |
dc.subject | Wet etching | en_US |
dc.subject | Potassium hydroxide | en_US |
dc.subject | Si mold | en_US |
dc.subject | Pattern transfer | en_US |
dc.subject | PDMS | en_US |
dc.title | Micro-pyramidal structure fabrication on polydimethylsiloxane (PDMS) by Si (100) KOH wet etching | en_US |
dc.type | Article | en_US |
dc.relation.no | 8 | - |
dc.relation.volume | 71 | - |
dc.identifier.doi | 10.3938/jkps.71.506 | - |
dc.relation.page | 506-509 | - |
dc.relation.journal | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.contributor.googleauthor | Hwang, Shinae | - |
dc.contributor.googleauthor | Lim, Kyungsuk | - |
dc.contributor.googleauthor | Shin, Hyeseon | - |
dc.contributor.googleauthor | Lee, Seongjae | - |
dc.contributor.googleauthor | Jang, Moongyu | - |
dc.relation.code | 2017000496 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF NATURAL SCIENCES[S] | - |
dc.sector.department | DEPARTMENT OF PHYSICS | - |
dc.identifier.pid | leesj | - |
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