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Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution

Title
Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution
Author
박진구
Keywords
N-polar GaN surface; Wafer bonding; Particle removal efficiency (PRE); Surface roughness; Sodium dodecyl sulfate (SDS)
Issue Date
2017-08
Publisher
ELSEVIER SCIENCE BV
Citation
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, v. 222, page. 1-6
Abstract
The present study investigated the removal of contaminated particles from a polished N-polar GaN surface using an alkaline cleaning solution along with sodium dodecyl sulfate (SDS) surfactant. The zeta potential, etch rate, and particle removal efficiency (PRE) of N-polar GaN surfaces were reported. A lower etch rate and smoother N-polar GaN surface were obtained when the surface is treated with a diluted NH4OH solution. However, the etch rate and PRE of the N-polar GaN surface increased as a function of the pH of the NH4OH solution. The PRE of the N-polar GaN surface reached to 96% at pH 10 with a high surface roughness of 0.5 nm. SDS was added to the ammonia solutions to control the surface roughness. The N-polar GaN surface reached 100% PRE and surface roughness shown less than 0.4 nm when cleaned in a diluted NH4OH solution with 5 mM SDS surfactant in a megasonic bath. (C) 2017 Elsevier B.V. All rights reserved.
URI
https://www.sciencedirect.com/science/article/pii/S0921510717300880?via%3Dihubhttp://repository.hanyang.ac.kr/handle/20.500.11754/115274
ISSN
0921-5107; 1873-4944
DOI
10.1016/j.mseb.2017.04.003
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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