Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이찬우 | - |
dc.date.accessioned | 2019-11-25T01:52:57Z | - |
dc.date.available | 2019-11-25T01:52:57Z | - |
dc.date.issued | 2017-05 | - |
dc.identifier.citation | ACS APPLIED MATERIALS & INTERFACES, v. 9, no. 22, page. 19231-19237 | en_US |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.uri | https://pubs.acs.org/doi/10.1021/acsami.7b04284 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/113971 | - |
dc.description.abstract | Owing to its high conductivity, solution processability, mechanical flexibility, and transparency, poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) has been extensively explored for use in functional devices including solar cells, sensors, light-emitting diodes, and supercapacitors. The ability to fabricate patterned PEDOT:PSS on a solid substrate is of significant importance to develop practical applications of this conducting polymer. Herein, we describe a new approach to obtain PEDOT:PSS patterns that are based on a polymerizable supramolecular concept. Specifically, we found that UV irradiation of a photopolymerizable diacetylene containing PEDOT:PSS film followed by development in deionized water and subsequent treatment with sulfuric acid (glass and silicon wafer) or formic acid (PET) produces micron-sized PEDOT:PSS patterns on solid substrates. The newly designed photolithographic method, which can be employed to generate highly conductive (>1000 S/cm) PEDOT:PSS patterns, has many advantages including the use of aqueous process conditions, a reduced number of process steps, and no requirement for plasma etching procedures. | en_US |
dc.description.sponsorship | This study was supported financially by the Samsung Research Funding Center of the Samsung Electronics under the project number SRFC-MA1501-06 and by the National Research Foundation of Korea (2014R1A2A1A0100862, 2015R1C1A1A02036599). | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | AMER CHEMICAL SOC | en_US |
dc.subject | PEDOT:PSS | en_US |
dc.subject | Polydiacetylene | en_US |
dc.subject | conducting polymer | en_US |
dc.subject | pattern | en_US |
dc.subject | photolithography | en_US |
dc.title | Polymerizable Supramolecular Approach to Highly Conductive PEDOT:PSS Patterns | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1021/acsami.7b04284 | - |
dc.relation.page | 19231-19237 | - |
dc.relation.journal | ACS APPLIED MATERIALS & INTERFACES | - |
dc.contributor.googleauthor | Kim, Tae Geun | - |
dc.contributor.googleauthor | Ha, Su Ryong | - |
dc.contributor.googleauthor | Choi, Hyosung | - |
dc.contributor.googleauthor | Uh, Kyungchan | - |
dc.contributor.googleauthor | Kundapur, Umesha | - |
dc.contributor.googleauthor | Park, Sumin | - |
dc.contributor.googleauthor | Lee, Chan Woo | - |
dc.contributor.googleauthor | Lee, Sang-hwa | - |
dc.contributor.googleauthor | Kim, Jaeyong | - |
dc.contributor.googleauthor | Kim, Jong-Man | - |
dc.relation.code | 2017001478 | - |
dc.sector.campus | S | - |
dc.sector.daehak | RESEARCH INSTITUTE[S] | - |
dc.sector.department | INSTITUTE OF NANO SCIENCE AND TECHNOLOGY | - |
dc.identifier.pid | lcw | - |
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