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Optimizing the Plasma Deposition Process Parameters of Antistiction Layers using a DOE(Design of Experiment)

Title
Optimizing the Plasma Deposition Process Parameters of Antistiction Layers using a DOE(Design of Experiment)
Other Titles
실험 계획법을 이용한 점착방지막용 플라즈마 증착 공정변수의 최적화 연구
Author
박진구
Keywords
nanoimprinting; antistiction layer; DOE(design of experiment)
Issue Date
2005-11
Publisher
한국재료학회
Citation
한국재료학회지, v. 15, No. 11, Page. 705-710
Abstract
NIL (nanoimprint lithography) technique has demonstrated a high potential for wafer size definition of nanometer as well as micrometer size patterns. During the replication process by NIL, the stiction between the stamp and the polymer is one of major problems. This stiction problem is moi·e important in small sized patterns. An antistiction layer prevents this stiction ana insures a clean demolding process. In this paper, we were using a TCP (transfer coupled plasma) equipment and C4F8 C4F8 as a precursor to make a Teflon-like antistiction layer. This antistiction layer was deposited on a 6 inch silicon wafer to have nanometer scale thicknesses. The thickness of deposited antistiction layer was measured by ellipsometry. To optimize the process factor such as table height (TH), substrate temperature (ST), working pressure (WP) and plasma power (PP), we were using a design of experimental (DOE) method. The table of full factorial arrays was set by the 4 factors and 2 levels. Using this table, experiments were organized to achieve 2 responses such as deposition rate and non-uniformity. It was investigated that the main effects and interaction effects between parameters. Deposition rate was in proportion to table height, working pressure and plasma power. Non-uniformity was in proportion to substrate temperature and working pressure. Using a response optimization, we were able to get the optimized deposition condition at desired deposition rate and an experimental deposition rate showed similar results.
URI
http://www.koreascience.or.kr/article/JAKO200511722705958.pagehttp://repository.hanyang.ac.kr/handle/20.500.11754/112052
ISSN
1225-0562; 2287-7258
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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