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Ruthenium CMP에서 Cerium Ammonium Nitrate와 알루미나 연마 입자가 연마 거동에 미치는 영향

Title
Ruthenium CMP에서 Cerium Ammonium Nitrate와 알루미나 연마 입자가 연마 거동에 미치는 영향
Other Titles
Effect of Cerium Ammonium Nitrate and Alumina Abrasive Particles on Polishing Behavior in Ruthenium Chemical Mechanical Planarization
Author
박진구
Keywords
Ru CMP; Noble metal CMP; CAN; Etch rate
Issue Date
2005-09
Publisher
한국전기전자재료학회
Citation
전기전자재료학회논문지, v. 18, No. 9, Page. 803-809
URI
http://kiss.kstudy.com/thesis/thesis-view.asp?key=2464312http://repository.hanyang.ac.kr/handle/20.500.11754/112050
ISSN
1226-7945; 2288-3258
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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