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Particle Adhesion and Removal on EUV Mask Layers During Wet Cleaning

Title
Particle Adhesion and Removal on EUV Mask Layers During Wet Cleaning
Author
박진구
Keywords
EUV mask surface; particle adhesion; interaction force; zeta potential; adhesion force
Issue Date
2005-07
Publisher
INST PURE APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v. 44, No. 7B, Page. 5479-5483
Abstract
Extreme ultraviolet (EUV) masks have a very stringent cleanliness requirement that present new challenges to nanolithography industry. The cleaning of EUV mask surface is required at every exposure level due to the absence of a pellicle layer. In this study, the adhesion and removal of particles on EUV masks is investigated by calculating the interaction force and measuring the adhesion force using atomic force microscopy (AFM). Zeta potential measurements showed that the calculated interaction force was attractive on Si capping layer and Cr absorbed layer for both silica and alumina particle at all pH ranges investigated. However, the measured adhesion force of Si capping layer was similar to that of bare Si at neutral and alkaline pHs. The calculated interaction force Of SiO(2) buffer layer was most repulsive and the lowest adhesion force was measured. This indicates that the SiO(2) buffer layer has a better cleaning efficiency at neutral and alkaline pH. The calculation of interaction force between particle and surface and measurement of adhesion force shows that a lower particle removal efficiency was expected on Cr absorber layer surface.
URI
https://iopscience.iop.org/article/10.1143/JJAP.44.5479/metahttp://repository.hanyang.ac.kr/handle/20.500.11754/112047
ISSN
0021-4922
DOI
10.1143/JJAP.44.5479
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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