Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 오혜근 | - |
dc.date.accessioned | 2019-07-22T02:37:35Z | - |
dc.date.available | 2019-07-22T02:37:35Z | - |
dc.date.issued | 2006-02 | - |
dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 48, No. 2, Page. 240-245 | en_US |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.issn | 1976-8524 | - |
dc.identifier.uri | http://www.jkps.or.kr/journal/view.html?uid=7444&vmd=Full | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/107687 | - |
dc.description.abstract | The photoresist of a column spacer is very sensitive to UV light, and its uniformity depends on the exposure process. In a proximity-type aligner, the exposure gap can control the light diffraction and intensity, which affect the column spacer thickness and the critical dimension. The limitation of non-flat mask and work stage causes a non-uniform exposure gap. Applying an attenuated phase shift mask can compensate for this handicap. By using commercial software, we analyzed the difference between a conventional mask and a phase-shift mask as a function of the exposure gap and examined changes in the column spacer's thickness loss and the critical dimension. In order to reduce the diffraction effect and to get a uniform intensity, we varied the transmission in an opaque mask area and found that the thickness uniformity could be improved by about 30 \%. Consequently, we expect the attenuated phase shift mask to have a larger possibility of improving the column spacer's thickness uniformity without any mechanical alteration. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | KOREAN PHYSICAL SOC(한국물리학회) | en_US |
dc.title | Improvement of column spacer uniformity in a TFT LCD panel | en_US |
dc.type | Article | en_US |
dc.relation.journal | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.contributor.googleauthor | Cho, J.H | - |
dc.contributor.googleauthor | Sohn, J.M | - |
dc.contributor.googleauthor | Kim, S.H | - |
dc.contributor.googleauthor | Kim, J.S | - |
dc.contributor.googleauthor | Kim, Y.H | - |
dc.contributor.googleauthor | Oh, HK | - |
dc.relation.code | 2009205987 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E] | - |
dc.sector.department | DEPARTMENT OF APPLIED PHYSICS | - |
dc.identifier.pid | hyekeun | - |
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