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Improvement of column spacer uniformity in a TFT LCD panel

Title
Improvement of column spacer uniformity in a TFT LCD panel
Author
오혜근
Issue Date
2006-02
Publisher
KOREAN PHYSICAL SOC(한국물리학회)
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 48, No. 2, Page. 240-245
Abstract
The photoresist of a column spacer is very sensitive to UV light, and its uniformity depends on the exposure process. In a proximity-type aligner, the exposure gap can control the light diffraction and intensity, which affect the column spacer thickness and the critical dimension. The limitation of non-flat mask and work stage causes a non-uniform exposure gap. Applying an attenuated phase shift mask can compensate for this handicap. By using commercial software, we analyzed the difference between a conventional mask and a phase-shift mask as a function of the exposure gap and examined changes in the column spacer's thickness loss and the critical dimension. In order to reduce the diffraction effect and to get a uniform intensity, we varied the transmission in an opaque mask area and found that the thickness uniformity could be improved by about 30 \%. Consequently, we expect the attenuated phase shift mask to have a larger possibility of improving the column spacer's thickness uniformity without any mechanical alteration.
URI
http://www.jkps.or.kr/journal/view.html?uid=7444&vmd=Fullhttp://repository.hanyang.ac.kr/handle/20.500.11754/107687
ISSN
0374-4884; 1976-8524
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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