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Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns

Title
Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns
Author
안일신
Keywords
Anisotropy; Contact hole; Effective medium theory; Ellipsometry
Issue Date
2006-02
Publisher
SPIE
Citation
Proceedings of SPIE - The International Society for Optical Engineering; SPIE 31st International Symposium on Advanced Lithography, v. 6155, Article no. 61550L
Abstract
We applied spectroscopic ellipsometry for possible determination of the size of contact holes. We fabricated contact hole patterns in two dimensional array to increase sensitivity and the size of contact hole varied from 80 to 150 nm. Variation of hole-diameter in few nm was distinguishable by comparing the features in ellipsometry parameter Δ, Ψ or the degree of polarization spectra. These features could be used to estimate the size of contact holes once they were calibrated by other techniques. When the photoresist film with dense contact hole pattern was regarded as a uniaxial material, the ellipsometry spectra could be analyzed with anisotropic optical model. In the process, the average size of contact hole could be estimated from the anisotropy of the film.
URI
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6155/61550L/Optical-anisotropy-approach-in-spectroscopic-ellipsometry-to-determine-the-CD/10.1117/12.656875.fullhttp://repository.hanyang.ac.kr/handle/20.500.11754/107655
ISBN
978-081946198-8
ISSN
0277-786X
DOI
10.1117/12.656875
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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