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Morphology control of patterned carbon nanofiber arrays for field emission applications

Title
Morphology control of patterned carbon nanofiber arrays for field emission applications
Author
김동욱
Keywords
carbon nanofiber; dc plasma-enhanced chemical vapor deposition; morphology; field emission
Issue Date
2006-01
Publisher
INST PURE APPLIED PHYSICS
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v. 45, No. 1A, Page. 346-349
Abstract
Carbon nanofibers (CNFs), grown by dc plasma-enhanced chemical vapor deposition, have differences in morphology and resulting field emission properties depending on underlying buffer layers. We patterned 200-nm-sized Ni catalyst dots, with 2 - 5 m spacing, by e-beam lithography and obtained regularly spaced vertically aligned CNF arrays. CNFs, grown on Ti-buffered Si substrates, showed a needle like shape with a high aspect ratio, but CNFs directly grown on Si substrates, had a cone like shape. The former showed a smaller turn-on field (11 V/ m) than the latter (27 V/ m), in field emission current measurements. Moreover, the maximum current density of the CNF array on Ti was as high as 10 A/cm2.
URI
https://iopscience.iop.org/article/10.1143/JJAP.45.346/metahttp://repository.hanyang.ac.kr/handle/20.500.11754/107597
ISSN
0021-4922
DOI
10.1143/JJAP.45.346
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > ETC
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