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Automatic Layout Decomposition for DPT

Title
Automatic Layout Decomposition for DPT
Author
신현철
Keywords
Decomposing; Double Patterning Technology; Lithography
Issue Date
2007-10
Publisher
대한전자공학회
Citation
ISOCC 2007 Conference, Page. 263 - 266
Abstract
Automatic layout decomposition techniques have been developed for double patterning technology (DPT). As CMOS manufacturing process scales down to 65nm and below, lithography resolution needs to be improved. DPT has been proposed to enhance the limitation of conventional lithography, by decomposing the layout design into two masks to relax the minimum spacing requirement. However, it is not always possible to decompose a layout into two masks. We have developed new automatic stitching techniques to resolve this problem. Experimental results show that the suggested techniques are promising in decomposing layouts for DPT.
URI
http://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE01789600&language=ko_KRhttp://repository.hanyang.ac.kr/handle/20.500.11754/107086
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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