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dc.contributor.author오혜근-
dc.date.accessioned2019-07-03T07:10:06Z-
dc.date.available2019-07-03T07:10:06Z-
dc.date.issued2007-10-
dc.identifier.citationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 51, No. 4, Page. 1413-1418en_US
dc.identifier.issn0374-4884-
dc.identifier.urihttp://www.jkps.or.kr/journal/view.html?uid=8915&vmd=Full-
dc.identifier.urihttp://repository.hanyang.ac.kr/handle/20.500.11754/107080-
dc.description.abstractCurrent 193-nm optical lithography and commercially available 193-nm resists have been pushed far beyond the previously expected critical dimension by using process extension technology for resolution enhancement technology. This paper deals with three kinds of process extension technologies, thermal treatment, polarization, and double patterning. These technologies are modeled and analyzed. If a 50 % pattern shrinkage due to thermal treatment, a 25 % resolution enhancement due to polarization, and a 50 % pattern shrinkage due to double patterning are supposed, an effective combination can generate a sub-50-nm pattern. When the pattern size is smaller, optical proximity effects are more severe. After describing optical proximity effects for each of these technologies, we discuss optical proximity correction methods.en_US
dc.language.isoen_USen_US
dc.publisherKOREAN PHYSICAL SOCen_US
dc.subjectlithographyen_US
dc.subjectlithography simulationen_US
dc.subjectthermal treatmenten_US
dc.subjectpolarizationen_US
dc.subjectdouble patterningen_US
dc.titleProcess Extension Techniques for Optical Lithography: Thermal Treatment, Polarization and Double Patterningen_US
dc.typeArticleen_US
dc.identifier.doi10.3938/jkps.51.1413-
dc.relation.journalJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.contributor.googleauthorKim, Sang-Kon-
dc.contributor.googleauthorOh, Hye-Keun-
dc.relation.code2007205987-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]-
dc.sector.departmentDEPARTMENT OF APPLIED PHYSICS-
dc.identifier.pidhyekeun-
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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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