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Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask

Title
Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask
Author
오혜근
Keywords
Attenuated phase shift mask; Chromeless phase lithography; Diffusion length; Post-exposure bake
Issue Date
2007-09
Publisher
SPIE
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v. 6730, Article no. 673042
Abstract
Microlithography has shown an amazing development over the last decade and has continued to be one of the critical success factors for enabling ever smaller feature sizes. The fabrication of leading edge devices strongly relies on the use of chemically amplified resist, where the post exposure bake (PEB) is among the most important process steps for obtaining smaller feature size with better linewidth control. PEB sensitivity is defined as the dependency of pattern size (or critical dimension, CD) variation on the perturbation of the PEB temperature and time throughout this paper. From the beginning of ArF (193 nm) lithography, PEB sensitivity becomes serious problem because ArF photoresist shows very severe dependency on PEB temperature and time. PEB sensitivity relies largely on photo-generated acid diffusion. If acid diffusion can be effectively controlled, PEB sensitivity will be improved. As pattern size decreases for a higher density device, this variation can be more than 10% of target CD. Therefore, PEB sensitivity and diffusion length becomes very important property for sub-90 nm pattern. This paper demonstrates the effect of acid diffusion length for each PEB temperature and time for the mask types of attenuated and chromeless phase shift mask. Differences can between the attenuated and chromeless phase shift masks as functions of PEB temperature and time and develop time. We compared the acid diffusion lengths as a function of PEB time. And we calculated acid distribution as functions of PEB time and diffusion length. CD uniformity, thickness loss and exposure latitude are also compared.
URI
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6730/673042/Acid-diffusion-length-limitation-for-45-nm-node-attenuated-and/10.1117/12.746510.full?SSO=1http://repository.hanyang.ac.kr/handle/20.500.11754/106918
ISBN
978-081946887-1
ISSN
0277-786X
DOI
10.1117/12.746510
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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