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반도체 공정용 차압식 질량 유량 제어 장치의 개발 및 성능 평가

Title
반도체 공정용 차압식 질량 유량 제어 장치의 개발 및 성능 평가
Other Titles
Development and Evaluation of Differential Pressure Type Mass Flow Controller for Semiconductor Fabrication Processing
Author
안강호
Keywords
Accuracy; Differential Pressure; Linearity; MFC (mass flow controller); Response Time; Semiconductor; Sensor
Issue Date
2008-12
Publisher
한국반도체디스플레이기술학회
Citation
반도체디스플레이기술학회지, v. 7, No. 3, Page. 29-34
Abstract
This paper describes the fabrication and characterization of a differential pressure type integrated mass-flow controller made of stainless steel for reactive and corrosive gases. The fabricated mass-flow controller is composed of a normally closed valve and differential pressure sensor. A stacked solenoid actuator mounted on a base-block is utilized for precise and rapid control of gas flow. The differential pressure flow sensor consisting of four diaphragms can detect a flow rate by deflection of diaphragm. By a feedback control from the flow sensor to the valve actuator, it is possible to keep the flow rate constant. This device shows a fast response less than 0.3 sec. Also, this device shows accuracy less than 0.1 % of full scale. It is confirmed that this device is not attacked by toxic gas, so the integrated mass-flow controller can be applied to advanced semiconductor processes which need fine mass-flow control corrosive gases with fast response.
URI
http://www.ndsl.kr/ndsl/search/detail/article/articleSearchResultDetail.do?cn=JAKO200817556469646&SITE=CLICKhttp://repository.hanyang.ac.kr/handle/20.500.11754/105236
ISSN
1738-2270
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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