κΉμμ
2019-01-15T05:28:51Z
2019-01-15T05:28:51Z
2018-08
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 73, No. 3, Page. 392-395
0374-4884
https://link.springer.com/article/10.3938/jkps.73.392
https://repository.hanyang.ac.kr/handle/20.500.11754/81295
For comparative friction studies, a reference sample, which holds stable and reproducible frictional characteristics, is required. Here, we have studied the frictional properties of native silicon oxide and silicon oxide formed through wet thermal oxidation by using lateral force microscopy. Once cleansed using solvents such as acetone, the friction measured on these frequently-used reference materials undergoes gradual change by a series of scanning. The friction is observed to increase with the number of scans and reaches about 1.5 times the initial value. We find that soft baking at 150 A degrees C - 200 A degrees C for 30 minutes can eliminate this problem.
This work was supported by National Research Foundation (NRF) of Korea grant funded by the Korea Government (2014R1A1A2056555, 2017R1D1B04036381).
en_US
KOREAN PHYSICAL SOC
Lateral Force Microscopy
LFM
Friction reference
Silicon oxide
Solvent
Problems of Using a Solvent-cleansed Silicon Oxide Substrate as the Friction Reference Sample at the Nanoscale
Article
3
73
10.3938/jkps.73.392
392-395
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Kim, Sunghyun
Kim, Suenne
2018000435
E
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]
DEPARTMENT OF PHOTONICS AND NANOELECTRONICS
skim446