오혜근
2018-03-19T00:04:42Z
2018-03-19T00:04:42Z
2016-01
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v. 15, No. 2, Article no. 210031-210039
1932-5150
1932-5134
https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-15/issue-2/021003/Impact-of-a-deformed-extreme-ultraviolet-pellicle-in-terms-of/10.1117/1.JMM.15.2.021003.full?SSO=1
http://hdl.handle.net/20.500.11754/48456
The usage of an extreme ultraviolet (EUV) pellicle is regarded as a potential solution for defect control because it can protect the mask from airborne debris. However, some obstacles disrupt realistic application of the pellicle, such as its structural weakness, the risk of thermal damage, and so on. For these reasons, flawless fabrication of the pellicle is impossible. We discuss the influence of a deformed pellicle in terms of the nonuniform intensity distribution and the critical dimension (CD) uniformity. When we consider a 16-nm periodic pattern with dipole illumination, a transmission difference (max-min) of 0.7% causes CD uniformity of 0.1 nm. The deflection of the aerial image caused by gravity is small enough to ignore. CD uniformity is ˂0.1 nm, even for the current gap of 2 mm between the mask and pellicle. However, wrinkling of the EUV pellicle, caused by heat, can cause serious image distortion because a wrinkled EUV pellicle experiences both transmission loss variation as well as CD nonuniformity. The local angle of a wrinkle (as opposed to the period or amplitude of a wrinkle) is the main factor that influences CD uniformity, and a local angle of ˂ similar to 16 deg is needed to achieve 0.1-nm CD uniformity for a 16-nm L/S pattern. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
This work was supported by the Future Semiconductor Device Technology Development Program #10045366 funded by Ministry of Trade, Industry & Energy and Korea Semiconductor Research Consortium.
en_US
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
extreme ultraviolet lithography
pellicle
pellicle deformation
critical dimension uniformity
LITHOGRAPHY
Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity
Article
2
15
10.1117/1.JMM.15.2.021003
210031-210039
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
Kim, In-Seon
Yeung, Michael
Barouch, Eytan
Oh, Hye-Keun
2016007288
E
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]
DEPARTMENT OF APPLIED PHYSICS
hyekeun