Browsing by Author 안진호

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Showing results 1 to 30 of 70

Issue DateTitleAuthor(s)
2016-056.7nm 리소그래피용 브래그 반사형 거울과 흡수체 물질 연구안진호
2014-04Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy안진호
2014-12Anode dependence of set voltage in resistive switching of metal/HfO2/metal resistors안진호
2012-02Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone안진호
2014-08Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography안진호
2011-11Carbon Contamination Analysis and Its Effect on Extreme Ultra Violet Mask Imaging Performance Using Coherent Scattering Microscopy/In-Situ Accelerated Contamination System안진호
2011-11Carbon contamination of EUV mask and its effect on CD performance안진호
2019-04Characteristics of band modulation FET on sub 10 nm SOI안진호
2011-06Characteristics of CVD graphene nanoribbon formed by a ZnO nanowire hardmask안진호
2016-07Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask안진호
2019-07Crystallized ZnO films by inserting the inert metal on ITO and their improved on/off current performance안진호
2014-07Dependence of Interface Charge Trapping on Channel Engineering in Pentacene Field Effect Transistors안진호
2014-06Dielectric function of Si1-xGex films grown on silicon-on-insulator substrates안진호
2013-01Dielectric Stacking Effect of Al2O3 and HfO2 in Metal-Insulator-Metal Capacitor안진호
2015-03Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)안진호
2015-11Effect of extreme ultraviolet photoresist underlayer optical properties on imaging performance안진호
2012-06Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy and In-situ Contamination System안진호
2014-03Electrode dependent interfacial layer variation in metal-oxide-semiconductor capacitor안진호
2013-03Enhanced light extraction from Y2O3:Eu3+ phosphor films via vacuum nano-imprint lithography using spin-on dielectric materials안진호
2016-03EUV pellicle 의 standoff 거리에 따른 이미지 전사 특성 평가안진호
2016-09EUV 펠리클 투과도에 따른 이미지 전사 특성 분석안진호
2012-11Evaluation of lithographic performance of extreme ultra violet mask using coherent scattering microscope안진호
2015-11Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography안진호
2011-12Fabrication of 2D photonic crystal assisted Y2O3:Eu3+ thin-film phosphors by direct nano-imprinting안진호
2016-09Fabrication of Fe3O4-ZnO core-shell nanoparticles by rotational atomic layer deposition and their multi-functional properties안진호
2011-01Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography안진호
2014-03FDTD simulation of transmittance characteristics of one-dimensional conducting electrodes안진호
2019-07Fe3O4-ZnO Core-Shell Nanoparticles Fabricated by Ultra-Thin Atomic Layer Deposition Technique as a Drug Delivery Vehicle안진호
2016-07GeOx interfacial layer scavenging remotely induced by metal electrode in metal/HfO2/GeOx/Ge capacitors안진호
2015-09HF 습식 식각을 이용한 극자외선 노광 기술용 SiNx 펠리클 제작 공정안진호