2016-05 | 6.7nm 리소그래피용 브래그 반사형 거울과 흡수체 물질 연구 | 안진호 |
2014-04 | Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy | 안진호 |
2014-12 | Anode dependence of set voltage in resistive switching of metal/HfO2/metal resistors | 안진호 |
2012-02 | Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone | 안진호 |
2022-07 | Atomic layer etching of SiO2 using trifluoroiodomethane | 안진호 |
2014-08 | Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography | 안진호 |
2011-11 | Carbon Contamination Analysis and Its Effect on Extreme Ultra Violet Mask Imaging Performance Using Coherent Scattering Microscopy/In-Situ Accelerated Contamination System | 안진호 |
2011-11 | Carbon contamination of EUV mask and its effect on CD performance | 안진호 |
2019-04 | Characteristics of band modulation FET on sub 10 nm SOI | 안진호 |
2011-06 | Characteristics of CVD graphene nanoribbon formed by a ZnO nanowire hardmask | 안진호 |
2018-04 | Characterization of Free-Standing Nano-Membranes by Using Ellipsometry | 안진호 |
2016-07 | Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask | 안진호 |
2020-07 | A comprehensive study on the effect of tin top and bottom electrodes on atomic layer deposited ferroelectric Hf˂inf˃0.5˂/inf˃Zr˂inf˃0.5˂/inf˃O˂inf˃2˂/inf˃ thin films | 안진호 |
2019-07 | Crystallized ZnO films by inserting the inert metal on ITO and their improved on/off current performance | 안진호 |
2014-07 | Dependence of Interface Charge Trapping on Channel Engineering in Pentacene Field Effect Transistors | 안진호 |
2014-06 | Dielectric function of Si1-xGex films grown on silicon-on-insulator substrates | 안진호 |
2013-01 | Dielectric Stacking Effect of Al2O3 and HfO2 in Metal-Insulator-Metal Capacitor | 안진호 |
2015-03 | Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL) | 안진호 |
2015-11 | Effect of extreme ultraviolet photoresist underlayer optical properties on imaging performance | 안진호 |
2012-06 | Effect on Critical Dimension Performance for Carbon Contamination of Extreme Ultraviolet Mask Using Coherent Scattering Microscopy and In-situ Contamination System | 안진호 |