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Showing results 1 to 20 of 351

Issue DateTitleAuthor(s)
2004-02A 3D Numerical Study of the Polishing Behavior during an Oxide Chemical Mechanical Planarization Process박진구
2016-12A novel cleaning approach to remove the carbon contaminant from Ru surface of EUV mask박진구
2011-05A Self-Assembled Monolayer-Based Micropatterned Array for Controlling Cell Adhesion and Protein Adsorption박진구
2014-01Abrasive and additive interactions in high selectivity STI CMP slurries박진구
2014-02Abrasive and additive interactions in high selectivity STI CMP slurries박진구
2013-01Acoustic cavitation behavior in isopropyl alcohol added cleaning solution박진구
2017-12Adhesion and removal behavior of particulate contaminants from EUV mask materials박진구
2017-12Adhesion and removal behavior of particulate contaminants from EUV mask materials박진구
2003-02Adhesion and removal of silica and alumina slurry particles during Cu CMP process박진구
2008-12Adhesion and Removal of Silica and Ceria Particles on the Wafer Surfaces in STI and Poly Si CMP박진구
2009-02Adhesion force change on multilayer EUVL mask due to laser induced plasma shock wave박진구
2020-12Adhesive resin composites with ceramic nanoparticles for enhanced light extraction efficiency of sandwiched LED device structure박진구
2017-08Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution박진구
2017-08Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution박진구
2009-12Analysis of Scratches Formed on Oxide Surface during Chemical Mechanical Planarization박진구
2018-05Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers박진구
2023-04-14Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application박진구
2019-06A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process박진구
2006-12Characteristics of high power laser shock waves and their cleaning performance박진구
2016-12Characterization of ammonium silicate residue during Polysilazane (PSZ) dry etching in NF3/H2O gas chemistry박진구

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