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Showing results 1 to 30 of 40

Issue DateTitleAuthor(s)
2020-092D Transition Metal Dichalcogenide Heterostructures for p- and n-Type Photovoltaic Self-Powered Gas Sensor김우희
2023-02Advanced Atomic Layer Deposition (ALD): Controlling the Reaction Kinetics and Nucleation of Metal Thin Films Using Electric Potential Assisted ALD김우희
2022-12-12Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method김우희
2022-06Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method김우희
2019-04Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers김우희
2022-11-29Area-selective atomic layer deposition of high-quality Ru thin films by chemo-selective adsorption of short alkylating agents김우희
2017-12Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation김우희
2018-10Area-selective Atomic Layer Deposition using Si Precursors as Inhibitors김우희
2020-11Atomic Layer Deposition of Pt on Surface Deactivated by Fluorocarbon Implantation: Investigation of Growth Mechanism김우희
2020-11Atomic Layer Deposition of Pt on the Surface Deactivated by Fluorocarbon Implantation: Investigation of the Growth Mechanism김우희
2018-06Comparative Study of the Growth Characteristics and Electrical Properties of Atomic-Layer-Deposited HfO2 Films obtained from Metal Halide and Amide Precursors김우희
2023-03-16Dysprosium Incorporation for Phase Stabilization of Atomic-Layer- Deposited HfO2 Thin Films김우희
2018-10The Effects of Ar Addition to O2 Plasma on the Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films김우희
2018-06Effects of Nb nanopin electrode on resistive random-access memory switching characteristics of NiO thin films김우희
2017-12Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone김우희
2021-02Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules김우희
2016-02Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor김우희
2019-08Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor김우희
2020-05Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes김우희
2015-05In Situ Surface Cleaning on a Ge Substrate using TMA and MgCp2 for HfO2-based Gate Oxides김우희
2017-02Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide김우희
2021-06Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity김우희
2022-07Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates김우희
2016-04Local Ferroelectric Responses of Epitaxial PbTiO3 Thin Films to Heated Atomic Force Microscopy김우희
2021-10Metal-insulator transition and interfacial thermal transport in atomic layer deposited Ru nanofilms characterized by ultrafast terahertz spectroscopy김우희
2019-09Out-of-Plane Piezoresponse of Monolayer MoS2 on Plastic Substrates Enabled by Highly Uniform and Layer-Controllable CVD김우희
2019-06Phase-Controlled Synthesis of SnOx Thin Films by Atomic Layer Deposition and Post-Treatment김우희
2019-03Piezoelectric and ferroelectric characteristics of P(VDF-TrFE) thin films on Pt and ITO substrates김우희
2016-04A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation김우희
2017-11Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns김우희

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