| 2018-10 | Density control of ZnO nanorod arrays using ultrathin seed layer by atomic layer deposition | 전형탁 |
| 2022-03 | Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition | 전형탁 |
| 2013-02 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition | 전형탁 |
| 2014-11 | Depth resolved band alignments of ultrathin TiN/ZrO2 and TiN/ZrO2-Al2O3-ZrO2 dynamic random access memory capacitors | 전형탁 |
| 2014-08 | Detection of oxygen ion drift in Pt/Al2O3/TiO2/Pt RRAM using interface-free single-layer graphene electrodes | 전형탁 |
| 2019-11 | Development of a SnS Film Process for Energy Device Applications | 전형탁 |
| 2017-01 | Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition | 전형탁 |
| 2012-12 | Dual optical functionality of local surface plasmon resonance for RuO2 nanoparticle-ZnO nanorod hybrids grown by atomic layer deposition | 전형탁 |
| 2015-01 | Effect of a Ti capping layer on thermal stability of NiSi formed from Ni thin films deposited by metal organic chemical vapor deposition using a Ni(Pr-i-DAD)(2) precursor | 전형탁 |
| 2018-04 | Effect of adding an insulator between metal and semiconductor layers on contact resistance | 전형탁 |
| 2022-01 | The effect of an annealing process on atomic layer deposited TiO2 thin films | 전형탁 |
| 2022-03 | The effect of an annealing process on atomic layer deposited TiO2 thin films (vol 33, 045705, 2022) | 전형탁 |
| 2011-07 | The Effect of Annealing Ambient on the Characteristics of an Indium-Gallium-Zinc Oxide Thin Film Transistor | 전형탁 |
| 2014-09 | Effect of Au interlayer thickness on the structural, electrical, and optical properties of GZO/Au/GZO multilayers | 전형탁 |
| 2012-12 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film | 전형탁 |
| 2011-01 | Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films | 전형탁 |
| 2021-08 | Effect of H2 annealing on SnS thin films grown by thermal evaporation and their transfer characteristics with Ti, W, and Mo electrodes | 전형탁 |
| 2022-06 | Effect of Hydrogen Plasma Treatment on Atomic Layer Deposited Silicon Nitride Film | 전형탁 |
| 2019-04 | Effect of microwave irradiation on the electrical and optical properties of SnO2 thin films | 전형탁 |
| 2018-08 | Effect of N Concentration Upon Resistive Switching Behavior of Au/Ni/TaON/NiSi ECM Devices | 전형탁 |
| 2022-05 | The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films | 전형탁 |
| 2016-11 | The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications | 전형탁 |
| 2018-08 | Effect of ozone concentration on atomic layer deposited tin oxide | 전형탁 |
| 2015-12 | The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer | 전형탁 |
| 2017-02 | Effect of scan speed on moisture barrier properties of aluminum oxide using spatial atomic layer deposition | 전형탁 |
| 2020-02 | Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition | 전형탁 |
| 2011-12 | The effects of a HfO2 buffer layer on Al2O3-passivated indium-gallium-zinc-oxide thin film transistors | 전형탁 |
| 2012-12 | Effects of a SiO2 buffer layer on the flatband voltage shift of La2O3 gate dielectric grown by using remote plasma atomic layer deposition | 전형탁 |
| 2012-12 | Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition | 전형탁 |
| 2011-09 | The effects of post-annealing on the performance of ZnO thin film transistors | 전형탁 |
