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Showing results 31 to 60 of 98

Issue DateTitleAuthor(s)
2017-02Effect of scan speed on moisture barrier properties of aluminum oxide using spatial atomic layer deposition전형탁
2011-12The effects of a HfO2 buffer layer on Al2O3-passivated indium-gallium-zinc-oxide thin film transistors전형탁
2012-12Effects of a SiO2 buffer layer on the flatband voltage shift of La2O3 gate dielectric grown by using remote plasma atomic layer deposition전형탁
2012-12Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition전형탁
2011-09The effects of post-annealing on the performance of ZnO thin film transistors전형탁
2012-12The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition전형탁
2014-12Electrical behavior of amorphous indium-gallium-zinc oxide thin film transistors by embedding Au nanoparticles in the channel layer전형탁
2013-03Electrical stability enhancement of the amorphous In-Ga-Zn-O thin film transistor by formation of Au nanoparticles on the back-channel surface전형탁
2015-03Endurance improvement due to rapid thermal annealing (RTA) of a TaO (x) thin film in an oxygen ambient전형탁
2016-06Engineering the crystallinity of tin disulfide deposited at low temperatures전형탁
2014-12Epitaxial Growth of Three-Dimensionally Mesostructured Single-Crystalline Cu2O via Templ-ated Electrodeposition전형탁
2018-03Fabrication of high crystalline SnS and SnS2 thin films, and their switching device characteristics전형탁
2016-01Fast spatial atomic layer deposition of Al2O3 at low temperature (˂ 100 degrees C) as a gas permeation barrier for flexible organic light-emitting diode displays전형탁
2013-01Formation of a crystalline nanotube-nanoparticle hybrid by post water-treatment of a thin amorphous TiO2 layer on a TiO2 nanotube array as an efficient photoanode in dye-sensitized solar cells전형탁
2012-12Gadolinium nitride films deposited using a PEALD based process전형탁
2015-03Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)(2) and oxygen remote plasma전형탁
2018-09H2S adsorption process on (0001) alpha-quartz SiO2 surfaces전형탁
2013-08History of atomic layer deposition and its relationship with the American Vacuum Society전형탁
2017-02Improved electrical properties of atomic layer deposited tin disulfide at low temperatures using ZrO2 layer전형탁
2015-10Improvement in the Positive Bias Temperature Stability of SnOx-Based Thin Film Transistors by Hf and Zn Doping전형탁
2016-03Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition전형탁
2014-09Improvement of thermal stability of nickel silicide film using NH3 plasma treatment전형탁
2013-10Influence of Different Annealing Ambients on the Properties of Zinc Sulfide Prepared by Atomic Layer Deposition전형탁
2014-10Influence of molybdenum source/drain electrode contact resistance in amorphous zinc-tin-oxide (a-ZTO) thin film transistors전형탁
2017-06Investigation of the barrier properties of copper-vanadium alloys with a sub-tantalum layer on low-k dielectrics전형탁
2013-09Investigation of the Flatband Voltage (V-FB) Shift of Al2O3 on N-2 Plasma Treated Si Substrate전형탁
2017-02Investigation of ultrathin Pt/ZrO2-Al2O3-ZrO2/TiN DRAM capacitors Schottky barrier height by internal photoemission spectroscopy전형탁
2018-07Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition전형탁
2011-07Luminescent mechanism of Eu3+-doped epitaxial Gd2O3 films grown on a Si (111) substrate using an effusion cell전형탁
2011-07Microstructural characterization at the interface of Al2O3/ZnO/Al2O3 thin films grown by atomic layer deposition전형탁

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