Browsing by Author 오혜근

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Showing results 92 to 105 of 105

Issue DateTitleAuthor(s)
2006-02Simulation of mask induced polarization effect on imaging in immersion lithography오혜근
2006-07Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks오혜근
2005-05Simulation of thermal resist flow process오혜근
2005-11Simulator for resist-reflow process by boundary movement오혜근
2006-12Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근
2007-01Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)오혜근
2017-02Thermal analysis of extreme ultraviolet pellicle with metallic coatings오혜근
2017-12thermo-optical optimization of extreme-ultraviolet pellicles for future generations오혜근
2016-06Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle오혜근
2016-03Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle오혜근
2007-09Which Mask is Preferred for Sub-60 nm Node Imaging?오혜근