Hanyang University repository

Browsing by Author 오혜근

Showing results 90 to 103 of 103

Issue Date	Title	Author(s)
2006-02	Simulation of mask induced polarization effect on imaging in immersion lithography	오혜근
2006-07	Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks	오혜근
2005-05	Simulation of thermal resist flow process	오혜근
2005-11	Simulator for resist-reflow process by boundary movement	오혜근
2006-12	Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography	오혜근
2008-11	Solving the Navier-Stokes Equation for Thermal Reflow	오혜근
2016-03	Stress-induced pellicle analysis for extreme-ultraviolet lithography	오혜근
2008-02	The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(	오혜근
2007-01	Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)	오혜근
2017-02	Thermal analysis of extreme ultraviolet pellicle with metallic coatings	오혜근
2017-12	thermo-optical optimization of extreme-ultraviolet pellicles for future generations	오혜근
2016-06	Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle	오혜근
2016-03	Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle	오혜근
2007-09	Which Mask is Preferred for Sub-60 nm Node Imaging?	오혜근