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Browsing by Author 오혜근
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Showing results 90 to 103 of 103
Issue Date
Title
Author(s)
2006-02
Simulation of mask induced polarization effect on imaging in immersion lithography
오혜근
2006-07
Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks
오혜근
2005-05
Simulation of thermal resist flow process
오혜근
2005-11
Simulator for resist-reflow process by boundary movement
오혜근
2006-12
Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography
오혜근
2008-11
Solving the Navier-Stokes Equation for Thermal Reflow
오혜근
2016-03
Stress-induced pellicle analysis for extreme-ultraviolet lithography
오혜근
2008-02
The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(
오혜근
2007-01
Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)
오혜근
2017-02
Thermal analysis of extreme ultraviolet pellicle with metallic coatings
오혜근
2017-12
thermo-optical optimization of extreme-ultraviolet pellicles for future generations
오혜근
2016-06
Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle
오혜근
2016-03
Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle
오혜근
2007-09
Which Mask is Preferred for Sub-60 nm Node Imaging?
오혜근
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