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Showing results 48 to 58 of 58

Issue DateTitleAuthor(s)
2018-06Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents오혜근
2007-04Resist Reflow Modeling Including Surface Tension and Bulk Effect오혜근
2008-02Resist reflow process for arbitrary 32 nm node pattern오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근
2007-01Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)오혜근
2017-02Thermal analysis of extreme ultraviolet pellicle with metallic coatings오혜근
2017-12thermo-optical optimization of extreme-ultraviolet pellicles for future generations오혜근
2016-06Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle오혜근
2016-03Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle오혜근

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