Browsing by Author 오혜근

Jump to:
All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
  • Sort by:
  • In order:
  • Results/Page
  • Authors/Record:

Showing results 83 to 105 of 105

Issue DateTitleAuthor(s)
2005-05Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography오혜근
2005-04Reduction of the Absorber Shadow Effect by Changing the Absorber Side Wall Angle in Extreme Ultraviolet Lithography오혜근
2006-02Reflow modeling for elongated contact hole shape오혜근
2018-06Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents오혜근
2007-04Resist Reflow Modeling Including Surface Tension and Bulk Effect오혜근
2008-02Resist reflow process for arbitrary 32 nm node pattern오혜근
2005-10Reticle Haze Measurement by Spectroscopic Ellipsometry오혜근
2005-12Rigorous coupled-wave analysis를 이용한 극자외선 리소그래피에서 그림자 효과를 줄이기 위한 마스크 변형오혜근
2005-10Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry오혜근
2006-02Simulation of mask induced polarization effect on imaging in immersion lithography오혜근
2006-07Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks오혜근
2005-05Simulation of thermal resist flow process오혜근
2005-11Simulator for resist-reflow process by boundary movement오혜근
2006-12Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근
2007-01Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)오혜근
2017-02Thermal analysis of extreme ultraviolet pellicle with metallic coatings오혜근
2017-12thermo-optical optimization of extreme-ultraviolet pellicles for future generations오혜근
2016-06Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle오혜근
2016-03Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle오혜근
2007-09Which Mask is Preferred for Sub-60 nm Node Imaging?오혜근