Browsing by Author 오혜근

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Showing results 70 to 99 of 105

Issue DateTitleAuthor(s)
2006-01Optical lithography simulator for the whole resist process오혜근
2006-02Optimization of chromeless phase mask by comparing scattering bars with zebra patterns오혜근
2008-09Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask오혜근
2008-02Optimum biasing for 45 nm node chromeless and attenuated phase shift mask오혜근
2008-02Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness오혜근
2018-10Pattern Degradation with Larger Particles on EUV Pellicle오혜근
2015-04Patterning dependence on the mask defect for extreme ultraviolet lithography오혜근
2008-11Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process오혜근
2007-02Photoresist adhesion effect of resist reflow process오혜근
2007-09Photoresist Adhesion Effect of Resist Reflow Process오혜근
2018-10A possible wafer heating during EUV exposure오혜근
2007-10Process Extension Techniques for Optical Lithography: Thermal Treatment, Polarization and Double Patterning오혜근
2007-04The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask오혜근
2005-05Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography오혜근
2005-04Reduction of the Absorber Shadow Effect by Changing the Absorber Side Wall Angle in Extreme Ultraviolet Lithography오혜근
2006-02Reflow modeling for elongated contact hole shape오혜근
2018-06Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents오혜근
2007-04Resist Reflow Modeling Including Surface Tension and Bulk Effect오혜근
2008-02Resist reflow process for arbitrary 32 nm node pattern오혜근
2005-10Reticle Haze Measurement by Spectroscopic Ellipsometry오혜근
2005-12Rigorous coupled-wave analysis를 이용한 극자외선 리소그래피에서 그림자 효과를 줄이기 위한 마스크 변형오혜근
2005-10Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry오혜근
2006-02Simulation of mask induced polarization effect on imaging in immersion lithography오혜근
2006-07Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks오혜근
2005-05Simulation of thermal resist flow process오혜근
2005-11Simulator for resist-reflow process by boundary movement오혜근
2006-12Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근