| 2008-11 | A mask generation approach to double patterning technology with inverse lithography | 오혜근 |
| 2016-05 | Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography | 오혜근 |
| 2016-09 | Mechanical stress induced by external forces in the extreme ultraviolet pellicle | 오혜근 |
| 2018-05 | modeling of thermomechanical changes of euv mask and their dependence on absorber variation | 오혜근 |
| 2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 오혜근 |
| 2016-03 | Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system | 오혜근 |
| 2008-09 | Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask | 오혜근 |
| 2008-02 | Optimum biasing for 45 nm node chromeless and attenuated phase shift mask | 오혜근 |
| 2008-02 | Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness | 오혜근 |
| 2015-04 | Patterning dependence on the mask defect for extreme ultraviolet lithography | 오혜근 |
| 2008-11 | Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process | 오혜근 |
| 2007-02 | Photoresist adhesion effect of resist reflow process | 오혜근 |
| 2007-04 | The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask | 오혜근 |
| 2018-06 | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | 오혜근 |
| 2007-04 | Resist Reflow Modeling Including Surface Tension and Bulk Effect | 오혜근 |
| 2008-02 | Resist reflow process for arbitrary 32 nm node pattern | 오혜근 |
| 2008-11 | Solving the Navier-Stokes Equation for Thermal Reflow | 오혜근 |
| 2016-03 | Stress-induced pellicle analysis for extreme-ultraviolet lithography | 오혜근 |
| 2008-02 | The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect( | 오혜근 |
| 2007-01 | Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL) | 오혜근 |
| 2017-02 | Thermal analysis of extreme ultraviolet pellicle with metallic coatings | 오혜근 |
| 2017-12 | thermo-optical optimization of extreme-ultraviolet pellicles for future generations | 오혜근 |
| 2016-06 | Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle | 오혜근 |
| 2016-03 | Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle | 오혜근 |
