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Showing results 37 to 60 of 60

Issue DateTitleAuthor(s)
2008-11A mask generation approach to double patterning technology with inverse lithography오혜근
2016-05Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography오혜근
2016-09Mechanical stress induced by external forces in the extreme ultraviolet pellicle오혜근
2018-05modeling of thermomechanical changes of euv mask and their dependence on absorber variation오혜근
2015-10Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction오혜근
2016-03Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system오혜근
2008-09Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask오혜근
2008-02Optimum biasing for 45 nm node chromeless and attenuated phase shift mask오혜근
2008-02Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness오혜근
2015-04Patterning dependence on the mask defect for extreme ultraviolet lithography오혜근
2008-11Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process오혜근
2007-02Photoresist adhesion effect of resist reflow process오혜근
2007-04The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask오혜근
2018-06Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents오혜근
2007-04Resist Reflow Modeling Including Surface Tension and Bulk Effect오혜근
2008-02Resist reflow process for arbitrary 32 nm node pattern오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근
2007-01Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)오혜근
2017-02Thermal analysis of extreme ultraviolet pellicle with metallic coatings오혜근
2017-12thermo-optical optimization of extreme-ultraviolet pellicles for future generations오혜근
2016-06Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle오혜근
2016-03Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle오혜근