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Showing results 24 to 53 of 58

Issue DateTitleAuthor(s)
2016-01Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity오혜근
2015-07Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity오혜근
2017-03Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography오혜근
2016-05The impact of the residual stress on the EUV pellicle오혜근
2017-01Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations오혜근
2017-06Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography오혜근
2017-10Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle오혜근
2008-12Influence of mask feature on the diffracted light in proximity and contact lithography오혜근
2016-09Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning오혜근
2008-11Influence of Various Defects on Extreme Ultra-Violet Mask오혜근
2009-06Investigation of Resolution Enhancement by Using Interferometric Immersion Lithography with a Lloyd Mirror오혜근
2008-11A mask generation approach to double patterning technology with inverse lithography오혜근
2016-05Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography오혜근
2016-09Mechanical stress induced by external forces in the extreme ultraviolet pellicle오혜근
2018-05modeling of thermomechanical changes of euv mask and their dependence on absorber variation오혜근
2015-10Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction오혜근
2016-03Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system오혜근
2008-09Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask오혜근
2008-02Optimum biasing for 45 nm node chromeless and attenuated phase shift mask오혜근
2008-02Optimum dose variation caused by post exposure bake temperature difference inside photoresist over different sublayers and thickness오혜근
2015-04Patterning dependence on the mask defect for extreme ultraviolet lithography오혜근
2008-11Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process오혜근
2007-02Photoresist adhesion effect of resist reflow process오혜근
2007-04The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask오혜근
2018-06Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents오혜근
2007-04Resist Reflow Modeling Including Surface Tension and Bulk Effect오혜근
2008-02Resist reflow process for arbitrary 32 nm node pattern오혜근
2008-11Solving the Navier-Stokes Equation for Thermal Reflow오혜근
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근

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