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Showing results 35 to 64 of 93

Issue DateTitleAuthor(s)
2008-11Haze defects due to pellicle adhesive오혜근
2009-11Heat conduction from hot plate to photoresist on top of wafer including heat loss to the environment오혜근
2008-11Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach오혜근
2008-11Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application오혜근
2016-01Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity오혜근
2015-07Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity오혜근
2017-03Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography오혜근
2016-05The impact of the residual stress on the EUV pellicle오혜근
2017-01Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations오혜근
2006-02Improvement of column spacer uniformity in a TFT LCD panel오혜근
2017-06Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography오혜근
2017-10Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle오혜근
2008-12Influence of mask feature on the diffracted light in proximity and contact lithography오혜근
2016-09Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning오혜근
2006-08The influence of transmission reduction by mask haze formation in ArF lithography오혜근
2008-11Influence of Various Defects on Extreme Ultra-Violet Mask오혜근
2006-11Investigation of optimum biasing and undercut for single trench alternating phase shift mask in 193 nm lithography오혜근
2009-06Investigation of Resolution Enhancement by Using Interferometric Immersion Lithography with a Lloyd Mirror오혜근
2005-03Line width variation with absorber thickness in extreme ultraviolet lithography오혜근
2006-02Mask error enhancement factor variation with pattern density for 65 nm and 90 nm line widths오혜근
2008-11A mask generation approach to double patterning technology with inverse lithography오혜근
2006-06Mask haze measurement by spectroscopic ellipsometry오혜근
2016-05Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography오혜근
2016-09Mechanical stress induced by external forces in the extreme ultraviolet pellicle오혜근
2006-08Modeling for Resist Reflow of an Elongated Contact Hole오혜근
2018-05modeling of thermomechanical changes of euv mask and their dependence on absorber variation오혜근
2015-10Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction오혜근
2016-03Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system오혜근
2006-02Numerical modeling of absorber characteristics for EUVL오혜근
2006-01Optical lithography simulator for the whole resist process오혜근

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