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Showing results 7 to 36 of 103

Issue DateTitleAuthor(s)
2007-01Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature오혜근
2008-11Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask오혜근
2007-09Acid diffusion length limitation for 45 nm node attenuated and chromeless phase shift mask오혜근
2008-06Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)오혜근
2008-06Anisotropic resist reflow process simulation for 22 nm elongated contact holes오혜근
2016-08Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system오혜근
2008-05Application of ellipsometry in immersion lithography오혜근
2017-03Arc-shaped slit effect of EUV lithography with anamorphic high NA system in terms of critical dimension variation오혜근
2005-10ArF photoresist parameter optimization for mask error enhancement factor reduction오혜근
2005-06ArF photoresist parameter optimization for mask error enhancement factor reduction오혜근
2005-06Bulk effects of thermal flow resists오혜근
2005-06Calibration-Free Multichannel Ellipsometry for Retardance Measurement오혜근
2017-03CD Error Caused by Aberration and Its Possible Compensation by Optical Proximity Correction in Extreme-Ultraviolet Lithography오혜근
2007-02Characteristics and prevention of pattern collapse in EUV lithography오혜근
2006-11Chromeless phase lithography using scattering bars and zebra patterns오혜근
2005-03Contact hole reflow by finite element method오혜근
2008-02Critical dimension control for 32 nm node random contact hole array using resist reflow process오혜근
2007-09Critical dimension control for 32 nm random contact hole array with resist reflow process오혜근
2017-09Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node오혜근
2005-11Defect characterization of Ru/Mo/Si EUV reflector by optical modeling오혜근
2005-07Determination of the optical functions of various liquids by rotating compensator multichannel spectroscopic ellipsometry오혜근
2007-08Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer오혜근
2016-04Eco-friendly photolithography using water-developable pure silk fibroin오혜근
2006-02The effect of transmission reduction by reticle haze formation오혜근
2008-08Ellipsometry for Pellicle-Covered Surface오혜근
2006-02EUV lithography simulation for the 32 nm node오혜근
2005-05The evaluation of aberration effects according to pattern shape and duty ratio오혜근
2006-07Evaluation of partial coherent imaging using the modulation transfer function in immersion lithography오혜근
2006-02Evaluation of partial coherent imaging using the transfer function in immersion lithography오혜근
2016-03Feasibility of a new absorber material for high NA extreme ultraviolet lithography오혜근

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