| 2001-09 | Parameter extraction for 193 nm chemically amplified resist from refractive index change | 안일신 |
| 2008-11 | Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process | 안일신 |
| 2006-06 | Patterning of Thin Copper Films under UV exposure in Chlorine-Based Liquids | 안일신 |
| 2004-07 | Photoinduced patterning of gold thin film | 안일신 |
| 2007-09 | Photoresist Adhesion Effect of Resist Reflow Process | 안일신 |
| 2006-09 | Picosecond Nonlinear OPtical Transmission Measurement on Anatase TiO2 THin Films | 안일신 |
| 2019-05 | Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer | 안일신 |
| 2001-03 | Post Exposure Delay Considerations in a 193-nm Chemically Amplified Resist | 안일신 |
| 2003-02 | A practical extracting method of PEB parameters by using rotating compensator spectroscopic ellipsometer, | 안일신 |
| 2003-02 | A Practical Method of Extracting the Photoresist Exposure Parameters by Using a Dose-to-Clear Swing Curve | 안일신 |
| 2003-06 | Process proximity correction by using neural network | 안일신 |
| 2001-12 | Real-Time Spectroscopic Ellipsometric Studies of Photo-Assisted Chemical Processes | 안일신 |
| 2023-09 | Regulation of Interfacial Anchoring Orientation of Anisotropic Nanodumbbells | 안일신 |
| 2003-02 | Resist Pattern Collapse Modeling for Smaller Features | 안일신 |
| 2003-06 | Resist Pattern Collapse with Top Rounding Resist Profile | 안일신 |
| 2008-02 | Resist reflow process for arbitrary 32 nm node pattern | 안일신 |
| 2003-06 | Rotating Compensator Spectroscopic Ellipsometer 의 개발 및 응용 | 안일신 |
| 2005-10 | Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry | 안일신 |
| 2004-05 | Simultaneous determination of bulk isotropic and surface-induced anisotropic complex dielectric functions of semiconductors from high speed Mueller matrix ellipsometry | 안일신 |
| 2006-12 | Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography | 안일신 |
| 2003-09 | A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry | 안일신 |
| 2000-03 | Soft Bake Effect in 193 nm Chemically Amplified Resist | 안일신 |
| 2005-06 | Spectroscopic Ellipsometry Studies of Thin Films Prepared by Glancing Angle Deposition | 안일신 |
| 2002-02 | Spectroscopic Ellipsometry Study of the Composition of Cobalt/SiO Thin Films | 안일신 |
| 2001-07 | Thickness Reduction Effect in a Chemically Amplified Resit Simulator | 안일신 |
| 2003-06 | Threshold energy resist model for critical dimension prediction | 안일신 |
| 2003-06 | Use of Rotating Compensator Spectroscopic Ellipsometry for Line-width Control | 안일신 |
| 2003-02 | Use of Rotating Compensator Spectroscopic Ellipsometry for Monitoring the Photoresist Etching on Si Wafer | 안일신 |
| 2003-12 | 분광 엘립소미트리를 이용한 유리기판 위의 박막분석 | 안일신 |
