| 2005-07 | Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios | 안일신 |
| 2005-08 | Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography | 안일신 |
| 2008-11 | A Mask Generation Approach to Double Patterning Technology with Inverse Lithography | 안일신 |
| 2006-06 | Mask Haze Measurement by Spectroscopic Ellipsometry | 안일신 |
| 2006-09 | Morphology and ellipsometry study of pentacene films grown on native SiO2 and glass substrates | 안일신 |
| 2006-11 | Nonlinear Optical Response of 1-D Photonic Crystals Fabricated by Using a SOl-Gel Method | 안일신 |
| 2006-02 | Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns | 안일신 |
| 2008-09 | Optimum Biasing for 45nm Node Chromeless and Attenuated Phase Shift Mask | 안일신 |
| 2008-02 | Optimum Dose Variation Caused By Post Exposure Bake Temperature Difference Inside Photoresist Over Different Sublayers And Thickness | 안일신 |
| 2008-11 | Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process | 안일신 |
| 2006-06 | Patterning of Thin Copper Films under UV exposure in Chlorine-Based Liquids | 안일신 |
| 2007-09 | Photoresist Adhesion Effect of Resist Reflow Process | 안일신 |
| 2006-09 | Picosecond Nonlinear OPtical Transmission Measurement on Anatase TiO2 THin Films | 안일신 |
| 2019-05 | Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer | 안일신 |
| 2008-02 | Resist reflow process for arbitrary 32 nm node pattern | 안일신 |
| 2005-10 | Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry | 안일신 |
| 2006-12 | Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography | 안일신 |
| 2005-06 | Spectroscopic Ellipsometry Studies of Thin Films Prepared by Glancing Angle Deposition | 안일신 |
