| 2001-12 | Hydrogenation of ZnO:Al Thin Films Using Hot Filament | 안일신 |
| 2006-08 | The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography | 안일신 |
| 2008-09 | Investigation of Laminated High-k Oxides by Using Vacuum Ultraviolet Spectroscopic Ellipsometry | 안일신 |
| 2006-11 | Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography | 안일신 |
| 2003-12 | Large optical nonlinearities in BiMnO3 thin films | 안일신 |
| 2005-07 | Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios | 안일신 |
| 2005-08 | Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography | 안일신 |
| 2003-02 | Lithography Process Optimization Simulator for an Illumination System | 안일신 |
| 2008-11 | A Mask Generation Approach to Double Patterning Technology with Inverse Lithography | 안일신 |
| 2006-06 | Mask Haze Measurement by Spectroscopic Ellipsometry | 안일신 |
| 2000-04 | Microstructural and electrical properties of BaxSr1-xTiO3 thin films on various electrodes | 안일신 |
| 2003-12 | Monitoring of photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry | 안일신 |
| 2004-08 | Morphological development and etching of gold thin film under UV-exposure in Chlorine-based liquids | 안일신 |
| 2006-09 | Morphology and ellipsometry study of pentacene films grown on native SiO2 and glass substrates | 안일신 |
| 2003-12 | Mueller matrix ellipsometry 제작 및 응용 | 안일신 |
| 2004-05 | Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle | 안일신 |
| 2003-05 | Multichannel Mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors | 안일신 |
| 2006-11 | Nonlinear Optical Response of 1-D Photonic Crystals Fabricated by Using a SOl-Gel Method | 안일신 |
| 2006-02 | Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns | 안일신 |
| 2003-03 | Optical Properties of the SiO-Co Composite Thin Films | 안일신 |
| 2008-09 | Optimum Biasing for 45nm Node Chromeless and Attenuated Phase Shift Mask | 안일신 |
| 2008-02 | Optimum Dose Variation Caused By Post Exposure Bake Temperature Difference Inside Photoresist Over Different Sublayers And Thickness | 안일신 |
| 2001-09 | Parameter extraction for 193 nm chemically amplified resist from refractive index change | 안일신 |
| 2008-11 | Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process | 안일신 |
| 2006-06 | Patterning of Thin Copper Films under UV exposure in Chlorine-Based Liquids | 안일신 |
| 2004-07 | Photoinduced patterning of gold thin film | 안일신 |
| 2007-09 | Photoresist Adhesion Effect of Resist Reflow Process | 안일신 |
| 2006-09 | Picosecond Nonlinear OPtical Transmission Measurement on Anatase TiO2 THin Films | 안일신 |
| 2019-05 | Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer | 안일신 |
| 2001-03 | Post Exposure Delay Considerations in a 193-nm Chemically Amplified Resist | 안일신 |
