| 2005-06 | Bulk Effects of Thermal Flow Resists | 안일신 |
| 2004-05 | Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer | 안일신 |
| 2005-06 | Calibration-Free Multichannel Ellipsometry for Retardance Measurement | 안일신 |
| 2001-02 | Calibrations in rotating compensator spectroscopic ellipsometry | 안일신 |
| 2018-04 | Characterization of Free-Standing Nano-Membranes by Using Ellipsometry | 안일신 |
| 2006-11 | Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns | 안일신 |
| 2019-10 | Comparison Imaging Ellipsometry and its Application to Crystallization of Indium Oxide Thin Films | 안일신 |
| 2018-03 | Comparison null imaging ellipsometry using polarization rotator | 안일신 |
| 2005-06 | Determination of the Optical Functions of Various Liquids by Rotating Compensator Multichannel Spectroscopic Ellipsometry | 안일신 |
| 2007-08 | Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer | 안일신 |
| 2017-10 | Development of micro-spot spectroscopic ellipsometer using reflective objectives | 안일신 |
| 2002-06 | Development of Multichannel Ellipsometry with Synchronously Rotating Polarizer and Analyzer | 안일신 |
| 2008-10 | Development of vacuum ultraviolet multichannel ellipsometry and its application to the characterization of ultrathin zirconium oxide films | 안일신 |
| 2004-06 | Effect of Extreme Ultraviolet Light Scattering from the Rough Absorber and Buffer Side Wall | 안일신 |
| 2006-02 | The Effect of Transmission Reduction by Reticle Haze Formation | 안일신 |
| 2008-02 | Ellipsometric inspection of the inner surface of pellicle-covered masks | 안일신 |
| 2007-03 | Ellipsometric studies of the absorption of liquid by photo resist | 안일신 |
| 2008-08 | Ellipsometry for Pellicle-Covered Surface | 안일신 |
| 2006-05 | Ellipsometry를 이용한 193 nm photoresist에서의 물의 흡수 연구 | 안일신 |
| 2003-12 | Ellipsometry에서의 calibration 및 입사면 고정형 ellipsometer | 안일신 |
| 2006-07 | Evaluation of Partial Coherent Imaging Using the Modulation Transfer Function in Immersion Lithography | 안일신 |
| 2004-06 | The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method | 안일신 |
| 2001-07 | Extraction of Exposure PArameters for 193-nm Chemically Amplified Resist and Its Application to Simulation | 안일신 |
| 2001-12 | Hydrogenation of ZnO:Al Thin Films Using Hot Filament | 안일신 |
| 2006-08 | The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography | 안일신 |
| 2008-09 | Investigation of Laminated High-k Oxides by Using Vacuum Ultraviolet Spectroscopic Ellipsometry | 안일신 |
| 2006-11 | Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography | 안일신 |
| 2003-12 | Large optical nonlinearities in BiMnO3 thin films | 안일신 |
| 2005-07 | Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios | 안일신 |
| 2005-08 | Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography | 안일신 |
