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Showing results 5 to 34 of 40

Issue DateTitleAuthor(s)
2005-06Bulk Effects of Thermal Flow Resists안일신
2005-06Calibration-Free Multichannel Ellipsometry for Retardance Measurement안일신
2018-04Characterization of Free-Standing Nano-Membranes by Using Ellipsometry안일신
2006-11Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns안일신
2019-10Comparison Imaging Ellipsometry and its Application to Crystallization of Indium Oxide Thin Films안일신
2018-03Comparison null imaging ellipsometry using polarization rotator안일신
2005-06Determination of the Optical Functions of Various Liquids by Rotating Compensator Multichannel Spectroscopic Ellipsometry안일신
2007-08Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer안일신
2008-10Development of vacuum ultraviolet multichannel ellipsometry and its application to the characterization of ultrathin zirconium oxide films안일신
2006-02The Effect of Transmission Reduction by Reticle Haze Formation안일신
2008-02Ellipsometric inspection of the inner surface of pellicle-covered masks안일신
2007-03Ellipsometric studies of the absorption of liquid by photo resist안일신
2008-08Ellipsometry for Pellicle-Covered Surface안일신
2006-05Ellipsometry를 이용한 193 nm photoresist에서의 물의 흡수 연구안일신
2006-07Evaluation of Partial Coherent Imaging Using the Modulation Transfer Function in Immersion Lithography안일신
2006-08The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography안일신
2008-09Investigation of Laminated High-k Oxides by Using Vacuum Ultraviolet Spectroscopic Ellipsometry안일신
2006-11Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography안일신
2005-07Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios안일신
2005-08Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography안일신
2008-11A Mask Generation Approach to Double Patterning Technology with Inverse Lithography안일신
2006-06Mask Haze Measurement by Spectroscopic Ellipsometry안일신
2006-09Morphology and ellipsometry study of pentacene films grown on native SiO2 and glass substrates안일신
2006-11Nonlinear Optical Response of 1-D Photonic Crystals Fabricated by Using a SOl-Gel Method안일신
2006-02Optical anisotropy approach in spectroscopic ellipsometry to determine the CD of contact hole patterns안일신
2008-09Optimum Biasing for 45nm Node Chromeless and Attenuated Phase Shift Mask안일신
2008-02Optimum Dose Variation Caused By Post Exposure Bake Temperature Difference Inside Photoresist Over Different Sublayers And Thickness안일신
2008-11Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process안일신
2006-06Patterning of Thin Copper Films under UV exposure in Chlorine-Based Liquids안일신
2007-09Photoresist Adhesion Effect of Resist Reflow Process안일신

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