Browsing by Author 박진구

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Showing results 87 to 108 of 108

Issue DateTitleAuthor(s)
2011-04Random yield loss during wafer cleaning박진구
2018-10Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents박진구
2015-08Removal of Nano-sized Particles Using Carbon Dioxide (CO2) Gas Cluster Cleaning without Pattern Damage박진구
2013-01Removal of UV cured resin using hybrid cleaning method박진구
2014-01Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography박진구
2013-01Removing W Polymer Residue from BEOL Structures using DSP+ (Dilute Sulfurec-Peroxide-HF) Mixture - A Case Study박진구
2013-01Role of mask patterns in fabrication of Si nanotip arrays박진구
2005-09Ruthenium CMP에서 Cerium Ammonium Nitrate와 알루미나 연마 입자가 연마 거동에 미치는 영향박진구
2019-02Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning박진구
2019-05Selection of CVD Diamond Crystal Size on a CVD Pad Conditioner for Improved Lifetime박진구
2017-01Self-assembled monolayer modified MoO3/Au/MoO3 multilayer anodes for high performance OLEDs박진구
2011-05A Self-Assembled Monolayer-Based Micropatterned Array for Controlling Cell Adhesion and Protein Adsorption박진구
2013-08Shockwave-induced deformation of organic particles during laser shockwave cleaning박진구
2013-01Study of highly selective and sensitive microarray structure based on hydrophilic/hydrophobic SAMS박진구
2019-08Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning박진구
2015-10Submicron Particle Removal during FPD Oxide TFT Process박진구
2019-09Ultrasound-induced break-in method for an incoming polyvinyl acetal (PVA) brush used during post-CMP cleaning process박진구
2013-09Wafer-scale nanowell array patterning based electrochemical mpedimetric immunosensor박진구
2012-08미세금형 가공을 위한 전기화학식각 공정의 유한요소 해석 및 실험결과 비교박진구
2014-07이류체 노즐을 이용한 FPD 세정시스템 및 공정 개발박진구
2012-03텅스텐 화학적-기계적 연마 공정에서 부식방지막이 증착된 금속 컨디셔너 표면의 전기화학적 특성평가박진구
2015-09포토마스크 펠리클 제조를 위한 Aluminum Frame 표면 세정공정 연구박진구